Above is an isometric view of a NanoCD 70 nm line, which extends to 3 mm total certified length.   The NanoCD is shown mounted into a 6" x 6" x ¼" aluminum carrier. STAY IN LINE WITH SUB-100 NM ACCURACY. The NanoCD™ (NCD) is the first commercially available standard to provide line width accuracy calibration at the 130 nm, 90 nm, 65 nm and 45 nm nodes. Use it for tool matching, calibrating the width CD-AFM tip or diagnostics in a CD-SEM, and prevent bias from ever leaving the mask shop. Product Description The NanoCD consists of a small chip containting a single isolated line 4 mm long (3 mm long), offering thousands of distinct measurement sites. Chips are fabricated at VLSI Standards using a patented technique that results in lines with high uniformity and low associated uncertainty, unachievable through conventional lithography methods. For compatibility with reticle handlers, the chip is mounted to an aluminum replica of a quartz photomask. Global alignment marks, rulers and pattern recognition features extending from the chip to the reticle ensure that the target is always located, and measurements can be repeated. The width of the line, or the Critical Dimension (CD), is certified with TEM and is traceable to NIST and to the international system of units (SI) through the atomic lattice spacing of single crystal silicon. Product Specifications Substrate 152 mm x 152 mm x 0.25 mm Al carrier. Nominal CD Values 25 nm, 45 nm, 70 nm, or 110 nm. Accuracy 25 nm ± 0.5 nm, 45 nm ± 0.7 nm, 70 nm ± 0.7 nm, 110 ± 0.8 nm Material of CD line Amorphous Silicon Length of Line 3 mm certified Defectivity of Line 5% Max. (150 µm of total 3,000 µm) Traceability Traceable to the SI units through the atomic lattice spacing in the silicon crystal by TEM